发明名称 Method and system for forming a patterned structure on a substrate
摘要 <p>The present disclosure concerns a method and system for providing a patterned structure (3p) on an acceptor substrate (4). The method comprises providing a donor substrate (10) arranged between a light source (5) and an acceptor substrate (4). A mask (7) is arranged between the light source (5) and the donor substrate (10). The mask (7) comprises a mask pattern (7p) for patterning light (6). The patterned light (6p) impinging the donor substrate (10) causes the donor material (3) to be released from the donor substrate (10) and transfer to the acceptor substrate (4) to form the patterned structure (3p) thereon. The patterned light (6p) is divided by the mask pattern (7p) into a plurality of separate homogeneously sized beams (6b) simultaneously impinging the donor substrate (10) for causing the donor material (3) to be released from the donor substrate (10) in the form of separate homogeneously sized droplets (3d).</p>
申请公布号 EP2883709(A1) 申请公布日期 2015.06.17
申请号 EP20130197502 申请日期 2013.12.16
申请人 NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO 发明人 HENDRIKS, ROB JACOB;ARUTINOV, GARI;SMITS, EDSGER CONSTANT PIETER
分类号 B41M3/00;B41M5/46 主分类号 B41M3/00
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