发明名称 METHOD FOR PRODUCING POLYCRYSTALLINE SILICON
摘要 <p>A process for producing polycrystalline silicon, comprising: a silicon deposition step for producing silicon through a reaction between a chlorosilane compound and hydrogen; a conversion reaction step for removing hydrogen chloride contained in an exhaust gas discharged from the silicon deposition step by bringing the exhaust gas into contact with activated carbon; a separation step for separating hydrogen contained in the gas after the conversion reaction obtained from the conversion reaction step; and a recycling step for supplying hydrogen obtained from the separation step to the silicon deposition step, wherein at least one of the following conditions (1) and (2) is satisfied: (1) the gas after the conversion reaction obtained from the conversion reaction step is brought into contact with an adsorbent containing a Lewis acid compound before the separation step; and (2) hydrogen obtained from the separation step is brought into contact with an adsorbent containing a Lewis acid compound before it is supplied to the silicon deposition step.</p>
申请公布号 EP2883836(A1) 申请公布日期 2015.06.17
申请号 EP20130828650 申请日期 2013.08.05
申请人 TOKUYAMA CORPORATION 发明人 MAJIMA TAKUYA;WAKAMATSU SATORU;SAKIDA MANABU
分类号 C01B33/03 主分类号 C01B33/03
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