感光性树脂组成物、硬化膜的制造方法、硬化膜、液晶显示装置及有机ＥＬ显示装置;PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE

摘要

提供可赋予低曝光量下的图案形成性，感度、经时稳定性、耐溶剂性、及热重量减少率优异，且合成步骤数并不增加的廉价的感光性树脂组成物、硬化膜的制造方法、硬化膜、液晶显示装置及有机EL显示装置。一种感光性树脂组成物，其含有：(A)包含下述通式(1)所表示的重复单元的聚苯并恶唑前驱物、(B)光酸产生剂、(C)溶剂、(D)交联剂、及(E)于分子中具有酸基经酸分解性基保护的基的化合物。;A photosensitive resin composition, a mehtod for manufacturing cured film, a cured film, a liquid crystal display device and an organic electroluminescence display device are provided. The photosensitive resin composition may give pattern forming ability under a low exposure amount, and have excellent sensitivity, temporal stability, solvent tolerance, and a thermal weight reducing rate. The photosensitive resin composition is cheap, and has no increase of synthesis steps. A photosensitive resin composition is provided, which includes: (A) a polybenzoxazole precursor including a repeating unit represented by the following general formula (1); (B) a photoacid generator; (C) a solvent; (D) a crosslinking agent; and (E) a compound having a group containing an acid group protected by an acid decomposing group in a molecule.