发明名称 Apparatus for thermal development with a conformable support
摘要 The present invention provides a method and apparatus for forming a printing form from a photosensitive element to form a relief pattern. The method and apparatus thermally develop the photosensitive element by heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium to the element to remove the liquefied composition. A conformable layer is disposed between the photosensitive element and a base support, which improves the compressibility and the contact between the photosensitive element and the development medium. The method and apparatus improve the efficiency of the removal of liquefied portions from the photosensitive element and the uniformity of the relief pattern formed.
申请公布号 US9057958(B2) 申请公布日期 2015.06.16
申请号 US201313934409 申请日期 2013.07.03
申请人 E I DU PONT DE NEMOURS AND COMPANY 发明人 Armstrong Mark L.;Chang Hao
分类号 B41N1/00;B41N3/00;G03F7/26;G03F7/34;G03F7/36 主分类号 B41N1/00
代理机构 代理人
主权项 1. A thermal development apparatus for forming a relief printing form from a photosensitive element having an exterior surface, a side opposite the exterior surface, and containing a composition layer capable of being partially liquefied comprising: means for supplying a development medium to the exterior surface; means for supporting having an outer surface for supporting the photosensitive element on the side opposite the exterior surface; means for heating the exterior surface to a temperature sufficient to cause a portion of the composition layer to liquefy; and means for contacting the photosensitive element with the development medium to allow at least a portion of the composition layer that is liquefied to be removed by the development medium, wherein a layer of conformable material having a compression modulus between 3 and 1500 psi and a Shore A hardness of 25 or less is secured to the means for supporting.
地址 Wilmington DE US