| 发明名称 | Thinner composition for RRC process, apparatus for supplying the same, and thinner composition for EBR process | ||
| 摘要 | A thinner composition for a reduced resist coating process includes an alkyl lactate, cyclohexanone, and an alkyl acetate, wherein an alkyl substituent of the alkyl acetate is a C1 to C5 non-ether based alkyl group. | ||
| 申请公布号 | US9057953(B2) | 申请公布日期 | 2015.06.16 |
| 申请号 | US201213598731 | 申请日期 | 2012.08.30 |
| 申请人 | SAMSUNG ELECTRONICS CO., LTD. | 发明人 | Yun Hyo-jin;Shin Sung-gun;Lee Hyo-sun;Kim Byung-uk;Kim Hyun-woo;Yoon Suk-il;Kweon Oh-hwan |
| 分类号 | G03F7/16;C11D11/00 | 主分类号 | G03F7/16 |
| 代理机构 | Lee & Morse, P.C. | 代理人 | Lee & Morse, P.C. |
| 主权项 | 1. A thinner composition for a reduced resist coating process or an edge bead removal process, the thinner composition comprising: about 40 parts by weight to about 90 parts by weight of an alkyl lactate, based on 100 parts by weight of the thinner composition; about 5 parts by weight to about 30 parts by weight of cyclohexanone, based on 100 parts by weight of the thinner composition; and about 1 part by weight to about 30 parts by weight of an alkyl acetate, based on 100 parts by weight of the thinner composition, wherein an alkyl substituent of the alkyl acetate is a C1 to C5 non-ether based alkyl group. | ||
| 地址 | Suwon-si, Gyeonggi-do KR | ||