发明名称 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
摘要 An illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source has a first optical path in which a diffractive optical element can be arranged at a first position thereof; a second optical path in which a spatial light modulator with a plurality of optical elements arrayed two-dimensionally and controlled individually can be arranged at a second position thereof; and a third optical path which is an optical path of light having passed via at least one of the first optical path and the second optical path and in which a distribution forming optical system is arranged. The distribution forming optical system forms a predetermined light intensity distribution on an illumination pupil located in the third optical path, based on the light having passed via at least one of the first and second optical paths.
申请公布号 US9057963(B2) 申请公布日期 2015.06.16
申请号 US201313866447 申请日期 2013.04.19
申请人 NIKON CORPORATION 发明人 Tanitsu Osamu
分类号 G03B27/32;G03B27/42;G03B27/54;G03B27/72;G03F7/20;G02B26/00;G02B26/02;G02B27/09 主分类号 G03B27/32
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. An illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source, the illumination optical system comprising: a first optical path in which a diffractive optical element can be arranged at a first position thereof; a second optical path in which a spatial light modulator with a plurality of optical elements arrayed two-dimensionally and controlled individually can be arranged at a second position thereof; a third optical path which is an optical path of light having passed via at least one of the first optical path and the second optical path and in which a distribution forming optical system is arranged, wherein the distribution forming optical system forms a predetermined light intensity distribution on an illumination pupil located in the third optical path, based on the light having passed via at least one of the first and second optical paths; and a selector that is configured to switch between an optical path in which the light from the light source is guided to the diffractive optical element arranged in the first optical path and an optical path in which the light source is guided to the spatial light modulator arranged at the second position.
地址 Tokyo JP