光酸产生剂、光阻、经涂覆基材及形成电子装置之方法;PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE

摘要

一种光酸产生剂化合物，其系具有式(1)：其中，n系0或1；以及，R 1 至R 6 系各自独立为氢，卤素，或未经取代或经取代之C1-20直链或分支链之烷基、C3-20环烷基、C6-20芳基、C3-20杂芳基、或具有下述结构之酸产生基团：其中，L系未经取代或经取代之C1-50二价基团；Z - 系单价阴离子基团；以及，M + 系錪或鋶阳离子。偕R基团可与它们所结合之碳组合以形成环，只要不形成超过两个此等环即可。R 1 至R 6 之至少一者系包括该酸产生基团，或两个偕R基团组合以形成该酸产生基团。又揭示一种并入有该光酸产生剂化合物之光阻组成物、包括该光阻组成物之层的经涂覆基材、以及使用该光阻组成物层形成电子装置之方法。; and R 1 -R 6 are each independently hydrogen, halogen, or unsubstituted or substituted C1-20linear or branched alkyl, C1-20cycloalkyl, C6-20aryl, C1-20heteroaryl, or an acid-generating group having the structure wherein L is an unsubstituted or substituted C1-50divalent group; Z - is a monovalent anionic group; and M + is an iodonium or sulfonium cation. Geminal R groups can combine to form a ring with the carbon to which they are attached, as long as no more than two such rings are formed. At least one of R 1 -R 6 includes the acid-generating group or two germinal R groups combine to form the acid-generating group. Also described are a photoresist composition incorporating the photoacid generator compound, a coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using a layer of the photoresist composition.