发明名称 Thin layer having composition gradient and production method thereof
摘要 Disclosed herein are a thin layer having a composition gradient and a method for the production of the thin layer. According to the method, the thin layer is produced by subjecting a mixture of one or more organic materials and one or more inorganic materials to a sol-gel process. The composition gradient and the surface energy of the thin layer are controlled during production, leaving no interfacial failure defects.
申请公布号 US9056331(B2) 申请公布日期 2015.06.16
申请号 US200912350620 申请日期 2009.01.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Lee Kwang Hee;Bulliard Xavier;Park Jong Jin;Choi Yun Hyuk
分类号 B32B3/00;B32B9/00;B05D7/00;C23C14/34;B05D7/04;B05D5/08;C23C14/02;C23C14/08;C23C14/10;B05D3/02 主分类号 B32B3/00
代理机构 Cantor Colburn LLP 代理人 Cantor Colburn LLP
主权项 1. A thin layer comprising a first layer including two or more materials selected from the group consisting of one or more organic materials and one or more inorganic materials wherein the thin layer has a composition gradient in the thickness direction and is produced by a sol-gel process, wherein the first layer includes tetraethylorthosilicate (“TEOS”), 3-glycidyloxypropyltrimethoxysilane (“GLYMO”), γ-aminopropyltriethoxysilane “γ-APS”) and dimethyldimethoxysilane (“DMDS”) in a molar ratio of about 2:2:1:1; further comprising a second layer formed on the first layer wherein the second layer includes two or more inorganic materials, having a composition gradient in the thickness direction, and has a small difference in surface energy at the interface with the first layer, wherein the two or more inorganic materials of the second layer are selected from the group consisting of metal oxides, metal nitrides and silicon oxides, and the composition of the second layer changes continuously in the thickness direction.
地址 KR