METHOD OF DETECTING INSPECTING AN EXTREME ULTRAVIOLET MASK AND APPARATUS FOR PERFORMING THE SAME

摘要

According to a method for detecting an extreme ultraviolet (EUV) mask, a first image of a first substrate having a plurality of first shot regions is obtained by performing a first exposure process using the EUV mask. First defects within the first image are detected by comparing first shot images of the first image with respect to the first shot regions of the first substrate to each other. A second image of a second substrate having a plurality of second shot regions is obtained by performing a second exposure process using the EUV mask. Second defects within the second image are detected by comparing second shot images of the second image with respect to the second shot regions of the second substrate to each other. The defects caused by the EUV mask are confirmed among the first and second defects by comparing the first image with the second image.