发明名称 Composite wiring board with electrical through connections
摘要 A composite wiring circuit with electrical through connections and method of manufacturing the same. The composite wiring circuit includes a glass with first electrically-conducting through vias. The first electrically-conducting through vias pass from a top surface of the glass layer to a bottom surface of the glass layer. The composite wiring circuit further includes an interposer layer with second electrically-conducting through vias. The second electrically-conducting through vias pass from a top surface of the interposer layer to a bottom surface of the interposer layer. The second electrically-conducting through vias are electrically coupled to the first electrically-conducting through vias.
申请公布号 US9059161(B2) 申请公布日期 2015.06.16
申请号 US201213623873 申请日期 2012.09.20
申请人 International Business Machines Corporation 发明人 Andry Paul S.;Colgan Evan G.;Wisnieff Robert L.
分类号 H05K1/03;H05K1/18;H05K1/14;H05K1/02;H01L23/498;H01L23/15 主分类号 H05K1/03
代理机构 代理人 Tuchman Ido;Dougherty Anne V.
主权项 1. A composite wiring circuit with electrical through connections, the composite wiring circuit comprising: a glass layer with first electrically-conducting through vias, the first electrically-conducting through vias passing from a top surface of the glass layer to a bottom surface of the glass layer, the first electrically-conducting through vias including a first pitch; an interposer layer with second electrically-conducting through vias, the second electrically-conducting through vias passing from a top surface of the interposer layer to a bottom surface of the interposer layer, the second electrically-conducting through vias including a second pitch that is smaller than the first pitch; a first redistribution wiring layer carried by the top surface of the interposer layer which faces the glass layer, the first redistribution wiring layer electrically coupling the first electrically-conducting through vias and the second electrically-conducting through vias; and a first coupling layer, wherein the first coupling layer electrically couples a top surface of first electrically-conducting through vias and a bottom surface of the second electrically-conducting through vias; wherein the first electrically-conducting through vias include a first diffusion barrier carried by the top surface of the first electrically-conducting through vias, the first diffusion barrier is electrically coupled to the top surface of the first electrically-conducting through vias, and the first coupling layer is electrically coupled to a top surface of the first diffusion barrier; wherein the second electrically-conducting through vias include a second diffusion barrier carried by the bottom surface of the second electrically-conducting through vias, the first coupling layer is electrically coupled to a bottom surface of the second diffusion barrier, and the bottom surface of the second diffusion barrier is electrically coupled to the bottom surface of the second electrically-conducting through vias; and wherein the first diffusion barrier and the second diffusion barrier include ball limiting metallurgy pads.
地址 Armonk NY US