发明名称 |
Composite wiring board with electrical through connections |
摘要 |
A composite wiring circuit with electrical through connections and method of manufacturing the same. The composite wiring circuit includes a glass with first electrically-conducting through vias. The first electrically-conducting through vias pass from a top surface of the glass layer to a bottom surface of the glass layer. The composite wiring circuit further includes an interposer layer with second electrically-conducting through vias. The second electrically-conducting through vias pass from a top surface of the interposer layer to a bottom surface of the interposer layer. The second electrically-conducting through vias are electrically coupled to the first electrically-conducting through vias. |
申请公布号 |
US9059161(B2) |
申请公布日期 |
2015.06.16 |
申请号 |
US201213623873 |
申请日期 |
2012.09.20 |
申请人 |
International Business Machines Corporation |
发明人 |
Andry Paul S.;Colgan Evan G.;Wisnieff Robert L. |
分类号 |
H05K1/03;H05K1/18;H05K1/14;H05K1/02;H01L23/498;H01L23/15 |
主分类号 |
H05K1/03 |
代理机构 |
|
代理人 |
Tuchman Ido;Dougherty Anne V. |
主权项 |
1. A composite wiring circuit with electrical through connections, the composite wiring circuit comprising:
a glass layer with first electrically-conducting through vias, the first electrically-conducting through vias passing from a top surface of the glass layer to a bottom surface of the glass layer, the first electrically-conducting through vias including a first pitch; an interposer layer with second electrically-conducting through vias, the second electrically-conducting through vias passing from a top surface of the interposer layer to a bottom surface of the interposer layer, the second electrically-conducting through vias including a second pitch that is smaller than the first pitch; a first redistribution wiring layer carried by the top surface of the interposer layer which faces the glass layer, the first redistribution wiring layer electrically coupling the first electrically-conducting through vias and the second electrically-conducting through vias; and a first coupling layer, wherein the first coupling layer electrically couples a top surface of first electrically-conducting through vias and a bottom surface of the second electrically-conducting through vias; wherein the first electrically-conducting through vias include a first diffusion barrier carried by the top surface of the first electrically-conducting through vias, the first diffusion barrier is electrically coupled to the top surface of the first electrically-conducting through vias, and the first coupling layer is electrically coupled to a top surface of the first diffusion barrier; wherein the second electrically-conducting through vias include a second diffusion barrier carried by the bottom surface of the second electrically-conducting through vias, the first coupling layer is electrically coupled to a bottom surface of the second diffusion barrier, and the bottom surface of the second diffusion barrier is electrically coupled to the bottom surface of the second electrically-conducting through vias; and wherein the first diffusion barrier and the second diffusion barrier include ball limiting metallurgy pads. |
地址 |
Armonk NY US |