发明名称 |
Infusion pump and method to enhance long term medication delivery accuracy |
摘要 |
An infusion pump is provided for pumping fluid though an administration set at a constant flow rate. The pump includes a pumping mechanism for pumping fluid and operates at a pulse frequency, and a controller controls the pulse frequency. Additionally, the pump has one or more sensors configured for measuring at least one characteristic value relating to a status of the infusion pump. The controller is configured for causing the pumping mechanism to operate at a first pulse frequency, and the one or more sensors measure the characteristic value intermittently. When the measured characteristic value meets a threshold value, the controller causes the pumping mechanism to operate at a second pulse frequency different from the first pulse frequency. |
申请公布号 |
US9056166(B2) |
申请公布日期 |
2015.06.16 |
申请号 |
US201313746061 |
申请日期 |
2013.01.21 |
申请人 |
BAXTER INTERNATIONAL INC.;BAXTER HEALTHCARE SA |
发明人 |
Zhu Hong |
分类号 |
A61M5/172;A61M5/142;A61M5/168;A61M5/145 |
主分类号 |
A61M5/172 |
代理机构 |
Greer, Burns & Crain, Ltd. |
代理人 |
Greer, Burns & Crain, Ltd. |
主权项 |
1. An infusion pump for pumping fluid though an administration set at a constant flow rate over a long duration, the pump comprising:
a pumping mechanism configured for pumping fluid, said pumping mechanism operating at a pulse frequency; and a controller for controlling said pulse frequency of said pumping mechanism; and one or more sensors capable of measuring at least one characteristic value relating to a status of said pumping mechanism; said controller configured for operating said pumping mechanism at a first pulse frequency; said one or more sensors measure said at least one characteristic value intermittently; and wherein when said at least one characteristic value meets a threshold value, said controller causes said pumping mechanism to operate at a second pulse frequency, said second pulse frequency being different from said first pulse frequency; wherein said threshold value is calculated based on a material used to form the administration set. |
地址 |
Deerfield IL US |