具有高无裂缝限度之ＣＩＧＳ奈米粒子墨水调配物;CIGS NANOPARTICLE INK FORMULATION HAVING A HIGH CRACK-FREE LIMIT

摘要

本发明揭示一种用于调配基于CIGS奈米粒子之墨水之方法，该墨水可经处理以形成具有500nm或更大之无裂缝限度(CFL)之薄膜，该方法包括：溶解或分散Cu(In,Ga)S2及Cu(In,Ga)Se2奈米粒子；混合该等奈米粒子溶液/分散液并加入油酸以形成墨水；在基板上沉积该墨水；退火以除去该墨水调配物之有机组分；形成具有CFL500nm之薄膜；及重复沉积及退火制程以形成具有厚度1μm之CIGS薄膜。如此制成之薄膜可并入薄膜光伏打装置中。; mixing the nanoparticle solutions/dispersions and adding oleic acid to form an ink; depositing the ink on a substrate; annealing to remove the organic components of the ink formulation; forming a film with a CFL500 nm; and, repeating the deposition and annealing process to form a CIGS film having a thickness1 μm. The film so produced may be incorporated into a thin film photovoltaic device.