发明名称 Optical electrical field enhancing device and measuring apparatus equipped with the device
摘要 An optical electrical field enhancing device includes: a transparent substrate having a structure of fine protrusions and recesses on the surface thereof; and a metal structure layer of fine protrusions and recesses formed on the surface of the structure of fine protrusions and recesses. The metal structure layer of fine protrusions and recesses has a structure of fine protrusions and recesses, in which the distances among adjacent protrusions are less than the distances among corresponding adjacent protrusions of the structure of fine protrusions and recesses of the transparent substrate.
申请公布号 US9059568(B2) 申请公布日期 2015.06.16
申请号 US201314033127 申请日期 2013.09.20
申请人 FUJIFILM Corporation 发明人 Yamazoe Shogo;Naya Masayuki;Hakuta Shinya
分类号 G01N21/55;H01S3/30;B82Y20/00;G01N21/552;G01N21/64;G01N21/65 主分类号 G01N21/55
代理机构 Birch, Stewart, Kolasch & Birch, LLP 代理人 Birch, Stewart, Kolasch & Birch, LLP
主权项 1. An optical electrical field enhancing device, comprising: a transparent substrate having a structure of fine protrusions and recesses on the surface thereof; and a structure layer of fine protrusions and recesses formed of metal on the structure of fine protrusions and recesses of the transparent substrate; the metal structure layer of fine protrusions and recesses having a structure of fine protrusions and recesses in which the distances among adjacent protrusions is less than the distances among adjacent protrusions corresponding thereto in the structure of fine protrusions and recesses of the transparent substrate; and an enhanced optical electrical field being generated on the surface of the metal structure layer of fine protrusions and recesses by an optical electrical field enhancing effect of localized plasmon induced on the surface of the metal structure layer of fine protrusions and recesses by light irradiated onto the structure layer of fine protrusions and recesses.
地址 Tokyo JP