发明名称 CHAMBER FOR SCRUBBER APPARATUS
摘要 <p>The present invention relates to a chamber for a scrubber apparatus wherein corrosion is prevented by forming a Nix coating layer or a PI coating layer on the surface of the chamber, and pinholes not formed as before and the entire surface uniformly coated as the Nix coating layer or the PI coating layer is formed via vapor deposition. The chamber for a scrubber apparatus comprises: an organic compound monomer deposited on the surface of the chamber for a scrubber apparatus; a polyimide coating layer applied to the surface of the chamber for a scrubber apparatus after the deposition; and a Nix coating layer applied to the surface of the polyimide coating layer.</p>
申请公布号 KR20150065457(A) 申请公布日期 2015.06.15
申请号 KR20130150812 申请日期 2013.12.05
申请人 SUNNIX. CO., LTD. 发明人 KIM, JAE MIN;PARK, KUEN BAE
分类号 C23C16/44;C23C16/22 主分类号 C23C16/44
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