THIN LAYERS DEPOSITION APPARATUS

摘要

A thin layer deposition apparatus is disclosed. A thin layer deposition apparatus according to an embodiment of the present invention comprises a process chamber in which a deposition process for a substrate proceeds; a deposition material source unit arranged inside the process chamber and spraying a deposition material toward the substrate; and a monitoring unit separated from the deposition material source unit, and arranged toward the deposition material source unit to monitor the deposition material source unit.