| 发明名称 |
SUBSTRATE SPREADING DEVICE FOR VACUUM PROCESSING APPARATUS, VACUUM PROCESSING APPARATUS WITH SUBSTRATE SPREADING DEVICE AND METHOD FOR OPERATING SAME |
| 摘要 |
A processing apparatus for processing a flexible substrate, particularly a vacuum processing apparatus for processing a flexible substrate, is described. The processing apparatus includes a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm. |
| 申请公布号 |
US2015158048(A1) |
申请公布日期 |
2015.06.11 |
| 申请号 |
US201414160121 |
申请日期 |
2014.01.21 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
RIES Florian;SAUER Andreas;HEIN Stefan |
| 分类号 |
B05C9/08;B05C1/12;B05D3/12;B05C15/00;B05C13/00;B05C1/08;B05C9/14 |
主分类号 |
B05C9/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A processing apparatus for processing a flexible substrate, comprising:
a vacuum chamber; a processing drum within the vacuum chamber, wherein the processing drum is configured to rotate around an axis extending in a first direction; and a heating device adjacent to the processing drum, wherein the heating device is configured for spreading the substrate in the first direction or for maintaining a spread of the substrate in the first direction, and wherein the heating device has a dimension in a direction parallel to a substrate transport direction of at least 20 mm. |
| 地址 |
Santa Clara CA US |
