PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide new photoacid generator compounds (PAGs) used for photoresist compositions, and photoresist compositions that comprise the compounds and can form high resolution images.SOLUTION: For example, a photoacid generator compound comprises a difluoro sulfonic acid cation component represented by the formula in the figure, where Rto Rare non-hydrogen substituents such as phenyl groups.