发明名称 PACKAGING STRUCTURE OF A MICROELECTRONIC DEVICE HAVING A HERMETICITY IMPROVED BY A DIFFUSION BARRIER LAYER
摘要 Packaging structure (100) comprising: -at least one hermetically sealed cavity (102) in which at least one microelectronic device (104) is arranged, the cavity being formed between a substrate (106) and at least one cap layer (108) through which at least one release hole (110) is formed, -at least one portion of metallic material (120) arranged on the cap layer and hermetically plugging the release hole, -at least one diffusion barrier layer (114) comprising at least one non- metallic material, arranged on the cap layer and forming a diffusion barrier against an atmosphere outside the cavity at least around the release hole.
申请公布号 WO2015082953(A1) 申请公布日期 2015.06.11
申请号 WO2013IB02991 申请日期 2013.12.06
申请人 COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIESALTERNATIVES;EPCOS AG 发明人 SAINT-PATRICE, DAMIEN;DEN DEKKER, ARNOLD;GIESEN, MARCEL;HENN, GUDRUN;PORNIN, JEAN-LOUIS;REIG, BRUNO
分类号 B81C1/00 主分类号 B81C1/00
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