| 摘要 |
<p>Provided are a dielectric window, an antenna, and a plasma processing apparatus, capable of improving uniformity on the surface of plasma. A slot plate (20) is arranged on one side of the dielectric window (16). A flat surface surrounded by a first concave part (147) of a ring shape and a plurality of second concave parts (153,153a-153g) formed on the lower side of the first concave part (147) are formed on the other side of the dielectric window (16). The antenna according to the present invention includes the dielectric window (16) and the slot plate (20) which is formed on one side of the dielectric window (16) and is applied to the plasma processing apparatus.</p> |
