| 发明名称 |
LITHOGRAPHIC APPARATUS |
| 摘要 |
A reflector includes a reflecting surface or structure provided with a cap layer formed from Silicene or a Silicene derivative. The reflector may be provided in a lithographic apparatus. |
| 申请公布号 |
US2015160569(A1) |
申请公布日期 |
2015.06.11 |
| 申请号 |
US201314401797 |
申请日期 |
2013.05.08 |
| 申请人 |
ASML Netherlands B.V. |
发明人 |
Osorio Oliveros Edgar Alberto |
| 分类号 |
G03F7/20;G02B27/00;G03F1/24;G02B5/08 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A reflector comprising a reflecting surface or structure provided with a layer, the layer comprising a substance selected from Silicene, or a Silicene derivative, or combinations thereof. |
| 地址 |
Veldhoven NL |
