发明名称 CROSS SECTION PROCESSING METHOD, AND CROSS SECTION PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cross section processing method and a cross section processing device by which a flat cross section can be formed on a sample including a plurality of kinds of substances different in hardness by a focused ion beam.SOLUTION: A cross section processing method comprises: the step of performing an etching treatment on a region to be processed while variably controlling an irradiation interval of a focused ion beam, its irradiation time, etc. on the basis of a piece of information of a cross section of SEM image obtained by observation of the cross section. With this method, a flat observation section can be formed at a uniform etching rate even if a sample includes a plurality of kinds of substances different in hardness.
申请公布号 JP2015109263(A) 申请公布日期 2015.06.11
申请号 JP20140209269 申请日期 2014.10.10
申请人 HITACHI HIGH-TECH SCIENCE CORP 发明人 SUZUKI HIDEKAZU;ASAHATA TATSUYA;UEMOTO ATSUSHI
分类号 H01J37/317;G01N1/28;H01J37/28 主分类号 H01J37/317
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