发明名称 |
CROSS SECTION PROCESSING METHOD, AND CROSS SECTION PROCESSING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a cross section processing method and a cross section processing device by which a flat cross section can be formed on a sample including a plurality of kinds of substances different in hardness by a focused ion beam.SOLUTION: A cross section processing method comprises: the step of performing an etching treatment on a region to be processed while variably controlling an irradiation interval of a focused ion beam, its irradiation time, etc. on the basis of a piece of information of a cross section of SEM image obtained by observation of the cross section. With this method, a flat observation section can be formed at a uniform etching rate even if a sample includes a plurality of kinds of substances different in hardness. |
申请公布号 |
JP2015109263(A) |
申请公布日期 |
2015.06.11 |
申请号 |
JP20140209269 |
申请日期 |
2014.10.10 |
申请人 |
HITACHI HIGH-TECH SCIENCE CORP |
发明人 |
SUZUKI HIDEKAZU;ASAHATA TATSUYA;UEMOTO ATSUSHI |
分类号 |
H01J37/317;G01N1/28;H01J37/28 |
主分类号 |
H01J37/317 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|