COATING FILM FORMING APPARATUS, COATING FILM FORMING METHOD, AND STORAGE MEDIUM

摘要

The present invention relates to an apparatus for forming a coating film capable of quickly forming a coating film on a substrate and increasing thickness uniformity of the coating film in a surface of the substrate. The apparatus for forming a coating film comprises: a ring-shape member installed in a ring shape along a circumference of a substrate to cover an upper side of a circumference of the substrate; and a lifting device lifting the ring-shaped member away from a substrate holding and supporting unit. The ring-shaped member is positioned at a position at which air current on an upper side of the circumferential part of the substrate is rectified. The substrate is rotated in a first rotation number to spread coating liquid supplied to a central part of the substrate toward a circumferential part by centrifugal force. The ring-shape member is removed and saved to a save position to suppress air current around the surface of the substrate from being scattered due to deterioration of the rotation number of the substrate. The rotation number of the substrate is lowered to a second rotation number lower than the first rotation number.