| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation source apparatus for mitigating debris particles in a region in which radiation propagates from a radiation source to an illuminator of a lithographic apparatus.SOLUTION: A lithographic apparatus includes a radiation source SO for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system D for mitigating debris particles that are released with the generation of radiation, and an optical system OS for collecting the radiation. The debris mitigation system is arranged either to directly evaporate the debris particles, to directly charge the debris particles, to directly produce plasma out of the debris particles, or to do any combination thereof, in a path A1 in which the radiation propagates from the radiation source to the optical system. |
