SALT, RESIST COMPOSITION, AND METHOD OF PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a salt which allows a resist pattern to be produced with good line edge roughness (LER).SOLUTION: The salt is represented by formula (I) [where Rand Reach independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group, provided that -CH- contained in the hydrocarbon group may be substituted with -O- or -CO-; m and n each independently represent 1 or 2; two R's are the same or different from each other when m is 2; two R's are the same or different from each other when n is 2; Arand Areach independently represent an optionally substituted aromatic hydrocarbon group or an optionally substituted heteroaromatic hydrocarbon group; and Aand Aeach independently represent an organic anion].