| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt capable of manufacturing a resist pattern with excellent line edge roughness (LER).SOLUTION: A compound is expressed by a formula (I). [In the formula (I), Qand Qare independently a fluorine atom or a perfluoroalkyl group having 1-6 carbon atoms. Lis a divalent saturated hydrocarbon group having 1-24 carbon atoms. Ris an alkanediyl group having 1-12 carbon atoms. Ris a hydrogen atom or an acid-labile group. W is an aliphatic ring having 3-36 carbon atoms. A methylene group forming the aliphatic ring may be substituted by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group. A hydrogen atom included in the aliphatic ring may be substituted by a hydroxy group, an alkyl group having 1-12 carbon atoms or an alkoxy group having 1-12 carbon atoms. m is 0 or 1. Zis an organic counterion.] |
