VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method for measuring the film thickness of a vapor-deposited film with high accuracy. ! SOLUTION: A vapor deposition apparatus comprises: a beam splitter 17 that is fitted to a wall of a piping part 2 so as to split first light 25 entering from a transmission window 16 into second light 26 entering the inside of the piping part 2 and third light 27 not entering the inside of the piping part 2; a transmission window 19 that is fitted to the wall of the piping part 2; a mirror 18 that is disposed inside the wall of the piping part 2 so that the second light 26 passes through a vaporized material 8 inside the piping part 2, passes through the transmission window 19, and outgoes from the transmission window 16; detectors 11, 12 that respectively detect the second light 26 outgoing from the transmission window 16 and third light 27 reflected by the beam splitter 17 and outgoing from the transmission window 16; and an analysis