发明名称 ION SOURCE
摘要 PROBLEM TO BE SOLVED: To improve reliability of an ion source. ! SOLUTION: An ion source 10 includes: a plasma chamber 12; an insulating member 52 provided so as to surround the outer periphery of the plasma chamber 12; a magnetic field generator 16 which is provided outside the insulating member 52 and generates a magnetic field B in the plasma chamber 12; and a vacuum container 18 for storing therein the plasma chamber 12, the insulating member 52, and the magnetic field generator 16. The plasma chamber 12 is connected to a power supply 62 for making the potential thereof higher than that of the magnetic field generator 16. The ion source 10 may further include an outer protective member 56 provided on an outer surface of the insulating member 52. The outer protective member 56 may be composed of a material having a secondary electron emission coefficient lower than that of the insulating member 52. ! COPYRIGHT: (C)2015,JPO&INPIT
申请公布号 JP2015109150(A) 申请公布日期 2015.06.11
申请号 JP20130250279 申请日期 2013.12.03
申请人 SUMITOMO HEAVY IND LTD 发明人 MURATA HIROHIKO ; TAKAHASHI NOBUAKI
分类号 H01J27/18;H01J37/08 主分类号 H01J27/18
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