| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for producing a polishing liquid composition capable of reducing scratches on a post-polished surface of a substrate.SOLUTION: A method for producing a polishing liquid composition comprises a step for filtering a silica dispersion liquid to be processed, which contains colloidal silica, with use of a filter containing a filtration assistant. The colloidal silica has an average particle diameter of primary particles of from 1 nm to 50 nm as determined by a titration method, and the filtration assistant has a hydroxyl group density of 0.40×10mol/mor more. It is preferable that the ratio of the average particle diameter of primary particles of the colloidal silica as determined by the titration method to the average particle diameter of the filtration assistant as determined by a laser particle size distribution measuring instrument is from 1.20×10to 4.20×10.</p> |
