发明名称 |
SEMICONDUCTOR DEVICE FOR ESD PROTECTION |
摘要 |
A semiconductor device for electrostatic discharge protection includes a substrate, a first well and a second well formed in the substrate. The first and second wells are formed side by side, meeting at an interface, and have a first conductivity type and a second conductivity type, respectively. A first heavily doped region and a second heavily-doped region are formed in the first well. A third heavily doped region and a fourth heavily-doped region are formed in the second well. The first, second, third, and fourth heavily-doped regions have the first, second, second, and first conductivity types, respectively. Positions of the first and second heavily-doped regions are staggered along a direction parallel to the interface. |
申请公布号 |
US2015162286(A1) |
申请公布日期 |
2015.06.11 |
申请号 |
US201214411550 |
申请日期 |
2012.10.22 |
申请人 |
CSMC TECHNOLOGIES FAB1 CO., LTD. |
发明人 |
Lin Zhongyu;Dai Meng;Hu Yonghai |
分类号 |
H01L23/60;H01L27/02 |
主分类号 |
H01L23/60 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device for electrostatic discharge protection, comprising:
a substrate; a first well formed in the substrate, the first well having a first conductivity type; a second well formed in the substrate, the second well having a second conductivity type different than the first conductivity type, the first and second wells being formed side by side and meeting at an interface; a first heavily-doped region having the first conductivity type and formed in the first well, the first heavily-doped region being positioned at a first distance from the interface; a second heavily-doped region having the second conductivity type and formed in the first well, the second heavily-doped region being positioned at a second distance from the interface; a third heavily-doped region having the second conductivity and formed in the second well, the third heavily-doped region being positioned at a third distance from the interface; and a fourth heavily-doped region having the first conductivity type and formed in the second well, the fourth heavily-doped region being positioned at a fourth distance from the interface, and the fourth distance being different from the third distance, wherein positions of the first and second heavily-doped regions are staggered along a direction parallel to the interface. |
地址 |
Jiangsu CN |