发明名称 METHOD OF DEPOSITION OF HIGHLY SCRATCH-RESISTANT DIAMOND FILMS ONTO GLASS SUBSTRATES BY USE OF A PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION
摘要 A system and process for inter alia coating or creating a substrate with a layer of carbon or diamond film using a microwave field and a hydrocarbon gas environment. The carbon or diamond film creates a stronger and more scratch resistant substrate that is less prone to breaking or cracking. Additionally, the coating may provide superior heat transfer properties enabling the final device to be used in passive cooling applications such as for mobile phone displays.
申请公布号 US2015159268(A1) 申请公布日期 2015.06.11
申请号 US201414529981 申请日期 2014.10.31
申请人 Rubicon Technology, Inc. 发明人 CIRALDO John P.
分类号 C23C16/27;C23C16/458;C23C16/52;C23C16/511 主分类号 C23C16/27
代理机构 代理人
主权项 1. A system for forming a film on a substrate, the system comprising: a source of gas that provides at least a carbon-based gas; a holding device to hold a target substrate; an environment configured to contain the gas about the target substrate; and a microwave source configured to project a microwave field towards the target substrate to create a carbon film upon the target substrate for creating a stronger and more scratch resistant substrate with enhanced thermal transport properties.
地址 Bensenville IL US