MANUFACTURING METHOD OF PROBE BLOCK FOR INSPECTING DISPLAY PANEL

摘要

The present invention relates to a manufacturing method of a probe block for panel inspection. The main purpose of the present invention is to provide a manufacturing method capable of minimizing a defect of a film used as a substrate, which influences a process yield and solves a traditional process problem and a yield degradation problem when the probe block for which a small pitch size is required is manufactured. To achieve the purpose, the present invention provides the manufacturing method of a probe block for panel inspection comprising: a step of preparing a process substrate; a step of forming a seed layer on the process substrate; a primary photolithography process step of laying a PR pattern on the seed layer to form a bump space; a step of forming a metal plating layer which becomes a bumper on a portion in which a PR is removed during a primary photolithography process by executing the electric gilding on the PR pattern; a secondary photolithography process step of layering a PR pattern on the PR pattern to form a wiring space; a step of forming a metal plating layer which becomes a wire on a portion in which the PR is removed during a secondary photolithography process by executing the electric gilding on the PR pattern which is formed in the secondary photolithography process; a step of bonding a film which becomes the substrate of the probe block on the wire; and a step of removing the process substrate, the seed layer, and the PR pattern.