发明名称 MIRROR ARRAY IN DIGITAL PATTERN GENERATOR (DPG)
摘要 Systems and method directed to digital pattern generator (DPG) having a mirror array in an e-beam lithography system are discussed. The mirror array includes a first bank of mirrors and a second bank of mirrors with a combination logic structure interposing the first and second banks of mirrors. An output data line extends from the first bank of mirrors to the combinational logic structure. An input data line that carries data associated with the second bank of mirrors is also provided to the combinational logic structure. An output data line extends from the combinational logic structure to second data bank.
申请公布号 US2015160568(A1) 申请公布日期 2015.06.11
申请号 US201314102309 申请日期 2013.12.10
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Yu Tsung-Hsin
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. An electron-beam lithography system, comprising: a digital pattern generator (DPG) having a mirror array, wherein the mirror array includes: a first bank of mirrors and a second bank of mirrors;a combinational logic structure interposing the first and second banks of mirrors;a first output data line from the first bank of mirrors to the combinational logic structure;an input data line provided to the combinational logic structure, wherein the input data line carries data associated with the second bank of mirrors; anda second output data line from the combinational logic structure to second data bank.
地址 Hsin-Chu TW