RESIN SOLUTION FOR TRANSPARENT INSULATING FILM, AND METHOD FOR PRODUCING TRANSPARENT INSULATING FILM

摘要

The present invention provides a resin solution for a transparent insulating film having exceptional transparency and adhesion to ITO, the resin solution being capable of serving as a transparent insulating film simply by formation of a film thereof. This resin solution for a transparent insulating film is characterized in containing: a fumaric-acid-ester-based resin that contains 50-99 mol% of fumaric acid diester residue units represented by general formula (1) below, and 1-50 mol% of (meth)acrylic acid ester residue units having oxetanyl groups represented by general formula (2) below and/or (meth)acrylic acid ester residue units having tetrahydrofurfuryl groups represented by general formula (3) below; a reactive silane compound; a reaction initiator; and a solvent for transparent insulating film production.