发明名称 BiCMOSプロセス技術における高電圧SCRMOS
摘要 <p>An integrated circuit containing an SCRMOS transistor. The SCRMOS transistor has one drain structure with a centralized drain diffused region and distributed SCR terminals, and a second drain structure with distributed drain diffused regions and SCR terminals. An MOS gate between the centralized drain diffused region and a source diffused region is shorted to the source diffused region. A process of forming the integrated circuit having the SCRMOS transistor is also disclosed.</p>
申请公布号 JP5730331(B2) 申请公布日期 2015.06.10
申请号 JP20120551160 申请日期 2010.12.20
申请人 发明人
分类号 H01L27/06;H01L21/336;H01L21/822;H01L27/04;H01L29/06;H01L29/749;H01L29/78 主分类号 H01L27/06
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