发明名称 高分子膜及びガスバリア材
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a polymer film having gas barrier properties and excellent in molding processability, and a gas barrier material. <P>SOLUTION: The polymer film includes a compound expressed by general formula (1) wherein R<SP POS="POST">1</SP>is a hydrogen atom or an electron donative group; R<SP POS="POST">2</SP>is a group which forms a polymer chain backbone; R<SP POS="POST">3</SP>is an aryl group or a double bond with a quinoid structure; R<SP POS="POST">4</SP>is a terminal group or a halogen atom of the polymer chain backbone; x and y are integers which satisfy 0≤x<100, 0<y≤100 and x+y=100, and numerical values that indicate a polymerization ratio of a monomer; and * denotes the position of a carbon atom of a side chain combined with a group that forms the polymer chain backbone. The polymer film is used as the gas barrier material. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5733816(B2) 申请公布日期 2015.06.10
申请号 JP20100242549 申请日期 2010.10.28
申请人 发明人
分类号 C08J5/18;C08F8/30;C08F38/02 主分类号 C08J5/18
代理机构 代理人
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