发明名称 |
METHOD OF MANUFACTURING LOW TEMPERATURE-DOPED GRAPHENE |
摘要 |
<p>For a method for doping graphene at low temperatures capable of doping various dopants, the present invention provides the method for doping the graphene at the low temperatures which includes the steps of: preparing a substrate including the graphene on one side thereof; arranging a doping member with one or more coating layers with one or more dopants of a p-type dopant, an n-type dopant, and a transition metal dopant on the upper side of the graphene to be separated from the substrate; and supplying the dopants to the graphene by performing a thermal treatment process when the graphene is separated from the doping member.</p> |
申请公布号 |
KR101526350(B1) |
申请公布日期 |
2015.06.10 |
申请号 |
KR20140028922 |
申请日期 |
2014.03.12 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YEUNGNAM UNIVERSITY |
发明人 |
PARK, IL KYU;SOHN, JUNG INN;CHA, SEUNG NAM |
分类号 |
H01L21/22;H01L21/265 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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