发明名称 METHOD OF MANUFACTURING LOW TEMPERATURE-DOPED GRAPHENE
摘要 <p>For a method for doping graphene at low temperatures capable of doping various dopants, the present invention provides the method for doping the graphene at the low temperatures which includes the steps of: preparing a substrate including the graphene on one side thereof; arranging a doping member with one or more coating layers with one or more dopants of a p-type dopant, an n-type dopant, and a transition metal dopant on the upper side of the graphene to be separated from the substrate; and supplying the dopants to the graphene by performing a thermal treatment process when the graphene is separated from the doping member.</p>
申请公布号 KR101526350(B1) 申请公布日期 2015.06.10
申请号 KR20140028922 申请日期 2014.03.12
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YEUNGNAM UNIVERSITY 发明人 PARK, IL KYU;SOHN, JUNG INN;CHA, SEUNG NAM
分类号 H01L21/22;H01L21/265 主分类号 H01L21/22
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