发明名称 制限付きゲートレベルレイアウトアーキテクチャにおける交差結合トランジスタレイアウト
摘要 A first gate level feature forms gate electrodes of a first transistor of a first transistor type and a first transistor of a second transistor type. A second gate level feature forms a gate electrode of a second transistor of the first transistor type. A third gate level feature forms a gate electrode of a second transistor of the second transistor type. The gate electrodes of the second transistors of the first and second transistor types are positioned on opposite sides of a gate electrode track along which the gate electrodes of the first transistors of the first and second transistor types are positioned. The gate electrodes of the second transistors of the first and second transistor types are electrically connected to each other through an electrical connection that includes respective gate contacts and a conductive interconnect structure.
申请公布号 JP5730424(B2) 申请公布日期 2015.06.10
申请号 JP20140063612 申请日期 2014.03.26
申请人 发明人
分类号 H01L21/8244;H01L21/82;H01L21/822;H01L21/8238;H01L27/04;H01L27/092;H01L27/11 主分类号 H01L21/8244
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