发明名称 Device and method for pvd process diagnostic using X-ray fluorescence local probe
摘要 <p>The invention relates to a diagnostics of plasma and flux of sputtered or evaporated particles of material inside a chamber, which is maintained at a low pressure. There is offered a device and a method for 2D or 3D X-ray fluorescence mapping analysis of plasma and/or flux of sputtered or evaporated particles of material, where the device comprises: a probe unit placed outside or inserted into a plasma and/or a flux of sputtered or evaporated particles of material and adapted to direct signals from a signal supplying unit to a signal detecting unit; a means for processing the detected signals and interpreting the signals received, wherein the device comprises a source (2) adapted for generating plasma and/or creating a flux of sputtered or evaporated particles of material; a X-ray source (11) adapted to send a collimating beam (14) through the plasma and/or the flux of sputtered or evaporated particles; a movable X-ray fluorescence polycapillary confocal probe (5) provided with at least an x- and y- axis manipulator (6), the probe (5) comprising an X-ray optic (7), being accommodated in a casing (8); where the probe (5) is adapted to collect the XRF signal from an intersect (17) the beam (14) provided by the X-ray source (11) and projection (line of sight (16)) of the probe (5); a X-ray energy sensitive detector (4) being optically connected with the probe (5) to enable the X-ray optic (7) to direct X-rays towards the detector (4) from the optic's (7) input end facing the beam (14).</p>
申请公布号 EP2881973(A1) 申请公布日期 2015.06.10
申请号 EP20130195583 申请日期 2013.12.04
申请人 INSTITUTE OF SOLID STATE PHYSICS, UNIVERSITY OF LATVIA 发明人 PURANS, JURIS
分类号 H01J37/32;C23C14/52;G01N23/223;H05H1/00 主分类号 H01J37/32
代理机构 代理人
主权项
地址