METHOD OF PRODUCING MONOPHASE INTERMETALLIC THIN FILM

摘要

FIELD: physics.SUBSTANCE: invention relates to the physics of nanosized structures and particularly to a method of producing a monophase intermetallic thin film with a nanosize structure on a glass substrate, and can be used in different high-technology fields of industry and science to form nanostructured materials based on intermetallic compounds. A glass substrate in a vacuum at residual pressure of not less than 10Torr is coated with at least six metal layers in the sequence Cu/Sn/Cu/Sn/Cu/Sn, each layer having thickness of 30-60 nm and a chemical reaction takes place between layers through relaxation annealing by heating in a vacuum from room temperature to 600°C at a rate of 1 degree per second to facilitate volumetric synthesis.EFFECT: obtaining a monophase intermetallic thin film.4 dwg, 2 tbl, 4 ex