| 摘要 |
<p>The invention provides a nozzle unit, a substrate processing device and a substrate processing method so as to save consumption of photoresist. The substrate processing device comprises a board for supporting the substrate, the nozzle unit applying pharmaceutical liquor to the supported substrate, and a driving unit which moves the substrate or the nozzle unit, so that a relative position between the substrate and the nozzle unit on the board is enabled to change. The nozzle unit comprises a first spraying component that sprays a first pharmaceutical liquor to the substrate in a transverse direction of the first spraying component formed in a first direction, and a second spraying component that sprays a second pharmaceutical liquor to the substrate in a transverse direction of the second spraying component formed in the first direction</p> |
