| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a deposition method that can efficiently form a multilayer film even in the roll to roll deposition while increasing the number of cycles per unit time in the atomic layer deposition (ALD) deposition, thereby suppressing an increase in size and footprint of a facility that is caused in association with the multilayering and the multi-cycling. <P>SOLUTION: The deposition method forms a thin film on a substrate using a material in a vapor state while continuously or intermittently transporting the substrate. The deposition method includes the steps of: disposing the substrate around a revolving drum; revolving the revolving drum at a first speed; supplying the revolving drum with at least two materials respectively; and transporting the substrate at a second speed, wherein the first and second speeds differ from each other. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
