发明名称 イオン源、システムおよび方法
摘要 <p>Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).</p>
申请公布号 JP5731377(B2) 申请公布日期 2015.06.10
申请号 JP20110513470 申请日期 2008.06.13
申请人 发明人
分类号 H01J37/244;H01J27/26;H01J37/08;H01J37/16;H01J37/20;H01J37/28 主分类号 H01J37/244
代理机构 代理人
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