Apparatus and method for etching organic layer

摘要

Provided are an apparatus and method for etching an organic layer, in which an organic material deposited in a non-layer forming area of a substrate is etched. The apparatus includes an etching chamber; a plasma generator configured to supply plasma into the etching chamber; a stage disposed in the etching chamber and configured to support the substrate; and a mask configured to guide the plasma toward the non-pixel area.

主权项

1. A method of etching an organic layer disposed on a non-pixel area of a substrate, the method comprising:
disposing the substrate on a stage disposed in an etching chamber; covering at least a portion of the substrate with a mask disposed in the etching chamber, by decreasing the distance between the stage and the mask; and etching an organic layer disposed on a non-pixel area of the substrate, by using the mask to direct plasma supplied to the etching chamber, toward the non-pixel area of the substrate.