发明名称 Alignment method, alignment apparatus, and organic electroluminescent (EL) element manufacturing apparatus
摘要 A method of carrying out alignment between a substrate and a mask, each having respective alignment marks. Vibrations attic substrate in a direction of gravity are measured. An antiphase vibrational wave is calculated, based an data corresponding to the measured vibrations. The antiphase vibrational wave is applied to the substrate, thereby reducing the vibrations or the substrate. When the vibrations of the substrate in the direction of gravity fall within a predetermined value that is set in advance, images are taken of relative positions of the alignment marks provided on the substrate and the mask, respectively, from the substrate side, and corresponding data is produced. Based on the data corresponding to the obtained images, an amount of movement of one of the substrate and the mask is calculated in a horizontal direction. One of the substrate and the mask is moved, based on the calculated movement amount.
申请公布号 US9054147(B2) 申请公布日期 2015.06.09
申请号 US201113270520 申请日期 2011.10.11
申请人 CANON KABUSHIKI KAISHA 发明人 Fukuda Naoto
分类号 G01B11/00;H01L21/68;C23C14/04;C23C14/54;H01L51/00;G01B11/14 主分类号 G01B11/00
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A method of carrying out alignment between a substrate and a mask, the substrate and the mask having respective alignment marks, the method comprising: irradiating the substrate with laser light and to measure vibrations of the substrate in a direction of gravity to produce vibration data; producing an antiphase vibrational wave, based on the corresponding vibration data produced in the irradiating step; applying the antiphase vibrational wave to the substrate, thereby reducing the vibrations of the substrate in the direction of gravity; at a time when the measured vibrations of the substrate in the direction of gravity fall within a predetermined value that is set in advance, taking images of relative positions of the respective alignment marks provided on the substrate and the mask, from the substrate side, in the direction of gravity, and producing data corresponding to the obtained images; calculating an amount of movement of one of the substrate and the mask in a horizontal direction, based on the data corresponding to the obtained images; and moving the one of the substrate and the mask, based on the calculated amount of movement.
地址 Tokyo JP