发明名称 |
Methods of fabricating transparent and nanomaterial-based conductive film |
摘要 |
The present invention relates to methods of fabricating transparent conductive films based on nanomaterials, in particular, silver nanowires. The present invention incorporates a single step of annealing and patterning the conductive films by using a high energy flash lamp without post treatment to improve the conductivity and create substantially invisible patterns on the films for use in touch panel or display manufacturing industry. |
申请公布号 |
US9050775(B2) |
申请公布日期 |
2015.06.09 |
申请号 |
US201213650187 |
申请日期 |
2012.10.12 |
申请人 |
NANO AND ADVANCED MATERIALS INSTITUTE LIMITED |
发明人 |
Fu Li;Sun Caiming;So Man-Ho;Li Kai;Li Chau-Shek;Lam Tak-Hei |
分类号 |
G03F7/20;B32B3/10;C09D11/00;G03F7/004;B82Y30/00 |
主分类号 |
G03F7/20 |
代理机构 |
Ella Cheong Hong Kong |
代理人 |
Ella Cheong Hong Kong ;Yip Sam T. |
主权项 |
1. A method of fabricating a transparent and nanomaterial-based conductive film comprising:
(a) cleaning a substrate as a support for the conductive film; (b) providing a non-photosensitive nanomaterial-containing ink; (c) coating said nanomaterial-containing ink on said substrate to form a coated substrate; (d) masking said coated substrate by a physical mask at one or more desired areas such that said desired areas being masked by said physical mask will become electrically non-conductive due to internal heat generated between the nanomaterials reduces junction resistance of the desired areas under exposure to a high energy flash light source while the other areas not being masked by said physical mask will become electrically conductive; and (e) exposing said coated substrate to the high energy flash light source to anneal and pattern said coated substrate in order to form the conductive film with a pattern while said conductive film is cured under said high energy flash light source without post-treatment including thermal or chemical curing. |
地址 |
HK |