Resist composition and resist pattern forming method

摘要

A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 represents a group having 0 to 20 carbon atoms, which is not a fluorine atom, and either R2 or R3 may form a ring with Y1; m represents an integer of 1 or more; and Mm+ represents an m-valent organic cation. In the formula (a0-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group or chain alkenyl group.

主权项

1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid, comprising:
a partial structure represented by the following general formula (a0-r-1) bonded to a compound comprising the resist composition or to a base material component (A), the base material component (A) comprising a high-molecular weight compound having a constituent unit (a0) represented by the following general formula (a0-1): wherein in the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a substituted or unsubstituted amino group, an alkoxy group, an aryloxy group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, an acylamino group, an alkoxycarbonylamino group, an aryloxycarbonylamino group, a sulfonylamino group, a hydroxy group, a mercapto group, a chlorine atom, a bromine atom, an iodine atom, a cyano group, a sulfo group, a carboxyl group, a nitro group, a hydroxamic acid group, a sulfino group, a hydrazino group, an imino group, a heterocyclic group, a silyl group; or a cyclic hydrocarbon group including an aromatic cyclic hydrocarbon group and an alicyclic hydrocarbon group which may contain a hetero atom in a ring structure thereof, in which some of hydrogen atoms bonded to the carbon atoms constituting the ring structure thereof may be substituted; and when either R2 or R3 is an alkyl group, one hydrogen atom of the alkyl group may be substituted with —C(═O)—O—R11 or —O—C(═O)—R11, wherein R11 represents an optionally substituted hydrocarbon group having 4 to 20 carbon atoms; and either R2 or R3 may form a ring with Y1; m represents an integer of 1 or more; Mm+ represents an m-valent organic cation; and * represents a bond to the remainder of the compound comprising the resist composition or to the base material component (A), and in the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group.