发明名称 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
摘要 According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.);
申请公布号 US9052590(B2) 申请公布日期 2015.06.09
申请号 US201013393173 申请日期 2010.08.31
申请人 FUJIFILM Corporation 发明人 Takahashi Hidenori;Hirano Shuji;Ito Takayuki;Tsubaki Hideaki
分类号 G03F7/004;G03F7/00;G03F7/20;G03F7/039 主分类号 G03F7/004
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. An actinic-ray- or radiation-sensitive resin composition comprising a resin (P) containing: at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by general formula (II) below; a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include that of general formula (II); and a repeating unit (D) containing a group that when acted on by an alkali developer is decomposed to thereby increase its dissolution rate in the alkali developer, in general formula (II), each of R21, R22 and R23 independently represents a hydrogen atom, an alkyl group, a monovalent aliphatic hydrocarbon ring group, a halogen atom, a cyano group or an alkoxycarbonyl group, provided that R22 may be bonded to Ar2 to thereby form a ring, which R22 in this instance is an alkylene group; Ar2 represents a bivalent aromatic ring group; X21 represents —O—, —S—, —CO—, —SO2—, —NR— (R represents a hydrogen atom or an alkyl group), a bivalent nitrogenous nonaromatic heterocyclic group or a group composed of a combination of these; L21 represents a single bond, an alkylene group, an alkenylene group, a bivalent aliphatic hydrocarbon ring group, a bivalent aromatic ring group or a group composed of a combination of two or more of these, provided that in the group composed of a combination, two or more groups combined together may be identical to or different from each other and may be linked to each other through, as a connecting group, —O—, —S—, —CO—, —SO2—, —NR— (R represents a hydrogen atom or an alkyl group), a bivalent nitrogenous nonaromatic heterocyclic group or a group composed of a combination of these; X22 represents a single bond, —O—, —S—, —CO—, —SO2—, —NR— (R represents a hydrogen atom or an alkyl group), a bivalent nitrogenous nonaromatic heterocyclic group or a group composed of a combination of these; L22 represents a bivalent aromatic ring group; and Z2 represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonate group.
地址 Tokyo JP