Securing of shadow mask and substrate on susceptor of deposition apparatus

摘要

Embodiments relate to a structure for securing a shadow mask and a susceptor where the top surface of the shadow mask mounted with the susceptor is flush with the top surface of the susceptor. When the susceptor is mounted with the shadow mask, the entire top surface of the susceptor and the shadow mask is substantially coplanar. A substrate onto which material is deposited is placed below the shadow mask. The susceptor moves below reactors for injecting materials or radicals. Since the entire top surface of the susceptor is substantially flat, the vertical distance between the reactors and the susceptor can be reduced, contributing to the overall quality of the layer formed on the substrate and reducing the materials wasted by leaking outside the gap between the susceptor and the reactors.

主权项

1. A deposition device comprising:
a reactor configured to inject one or more materials or radicals; a susceptor configured to move across the reactor to expose different portions of a substrate mounted on the susceptor to the one or more materials or radicals to deposit material; and a shadow mask secured onto the substrate, the shadow mask comprising:
a frame provided with a mechanical locking structure configured to secure the shadow mask to the susceptor, the mechanism provided on surfaces of the frame other than a top surface of the frame; anda stencil secured onto the frame and formed with patterns to expose the selected regions of the substrate to the materials or radicals, wherein a top surface of the stencil and a top surface of portions of the susceptor adjacent to the stencil are substantially coplanar when the frame is secured to the susceptor.