Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition

摘要

A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation:
Z-A-X-B-R  (I)
wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

主权项

1. A photosensitive composition, comprising:
(A) a resin containing a repeating unit derived from a compound represented by the following formula (I), the compound of formula (I) being an acrylic acid derivative, a methacrylic acid derivative or a styrene derivative, and the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation:
Z-A-X-B-R  (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents —SO2— or —SO—; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y is a group having a structure having one addition polymerizable unsaturated bond, the structure being selected from the group consisting of an acrylic acid ester, a methacrylic acid ester and a vinyl structure.