发明名称 Self-conditioning polishing pad and a method of making the same
摘要 The present invention is directed to a self-conditioning polishing pad. The self-conditioning polishing pad comprises an insoluble polymeric foam matrix and insoluble polymeric foam particles within the foam matrix. The particles are coated with a water-soluble component over a portion of the surface area of the particle. The particles may have a diameter in the range of 5 to 1000 microns in diameter.
申请公布号 US9050697(B2) 申请公布日期 2015.06.09
申请号 US201313797121 申请日期 2013.03.12
申请人 JH Rhodes Company, Inc. 发明人 Daskiewich Scott B.
分类号 B24D11/00;B32B5/22;B24B37/24;B24B37/26;C08J9/35 主分类号 B24D11/00
代理机构 Snell & Wilmer L.L.P. 代理人 Snell & Wilmer L.L.P.
主权项 1. A polishing pad comprising: an insoluble polymeric foam matrix; and a plurality of coated particles, wherein said plurality of coated particles each comprise insoluble polymeric foam particles coated with a water-soluble component, wherein said insoluble polymeric foam particles are coated over about 5% to 90% of the surface area of said insoluble polymeric foam particles with the water-soluble component in order to provide an effective bond between the insoluble polymeric foam matrix and the insoluble polymeric foam particles.
地址 Tempe AZ US